VENA series Auto RF Match is used into the vacuum thin film coating equipments for the processes such as plasma cleaning, plasma etching, magnetron sputtering, PECVD etc. The main function is to realize the auto matching function, and solves the technical vacancy.
Currently the domestic manufacturers mainly utilize the hand operated RF Match. And it is not so convenient to use the hand operated RF Match. Continuous operation is needed to adjust the impedance of the RF Match to achieve the process goal. While, the auto match can fill up the gap and owns the features of speediness, automatism, reliability, high efficiency, accuracy, saving labor and time. The optional RF systematic detection module can real time detect the system’s forward power, reflect power, standing wave ratio, RF signal peak voltage, current, DC bias voltage. An in so doing it can make you detect and decrease the process variety. The products cover 500w, 1000w, 2000w.
Features and advantages:
Advantages
Features
1、Reliability & stability for longtime
2、Real time reflect power test and control
3、Optimized design. Easy to install, use, and repair
4、broad range of matching, suitable for complicate load system
5、High efficiency in transmission
6、Low noise
7、Well shielding
8、Strict reliable test
1、Strengthened thin film plating and etching process
2、Optimized RF Match arithmetic to speed up the matching time
3、Reduce the standing-wave ratio and the reflect ratio utmost
